CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY

Smart overview of the Invention

The patent application describes a method for forming semiconductor devices using a specialized photoresist layer. This photoresist layer, which is applied over a substrate, is exposed to radiation to create a specific pattern. The unexposed portions of the layer are then selectively removed, leaving behind a patterned photoresist layer. The composition of this photoresist includes a fluorine-containing polymer, a crosslinker, and a photoactive compound.

Background

The semiconductor integrated circuit (IC) industry has seen rapid growth due to technological advancements in materials and design. Each new generation of ICs features smaller and more complex circuits than its predecessors. This miniaturization increases functional density, leading to more efficient production and reduced costs. However, it also complicates the manufacturing processes for ICs.

Technical Details

Various embodiments and examples are provided to illustrate the implementation of different features of this technology. These examples are meant to simplify the disclosure but are not limiting. The patent discusses the potential for different configurations and arrangements, including the possibility of additional features being introduced between existing ones. Spatial terms are used for descriptive purposes and may vary depending on device orientation.

Chemical Definitions

The document defines several chemical terms used throughout the application. For instance:

• Alkyl: A straight or branched hydrocarbon chain with no unsaturation, containing one to twelve carbon atoms.
• Alkylene: A divalent hydrocarbon chain linking parts of a molecule, with no unsaturation.
• Alkene: A hydrocarbon chain containing at least one double bond.
• Alkyne: A hydrocarbon chain containing at least one triple bond.

Additional Chemical Groups

The patent also defines various other chemical groups that include heteroatoms or specific structural features:

• Cycloalkyl: A non-aromatic monocyclic or polycyclic carbocyclic radical.
• Aryl: A ring system with at least one carbocyclic aromatic ring, potentially including multiple rings.
• Heteroalkyl: An alkyl group containing at least one heteroatom within or at its terminus.